Oscar Murillo and Zhang Enley

Exhibition March 23 − May 31, 2019
The Chi K11 Art Museum in Shanghai hosts an exhibition that includes recent works. Oscar Murillo and the works of Chinese artist Zhang Enli. By combining them, the authors try to establish a dialogue and explore conceptual similarities in their expansive works.

One of the most famous Chinese artists today, Zhang Enli is known for his picturesque observations of the prosaic elements in everyday life. In recent years, the author has devoted himself to finding alternative ways of painting, using various surfaces.

Like Zhang, Murillo also draws inspiration from his work environment — in places like airplanes and hotels. Stitched, drawn horizontal lines passing through the work of the author hint at disorienting movements that shape our current conditions: capital flows, flight paths and migration routes. The artist is interested in discovering the processes of globalization for artistic research and thereby in formulating a subtle understanding of the specific conditions in it.